著者名,論文名,雑誌名,ISSN,出版者名,出版日付,巻,号,ページ,URL,URL(DOI)
Giovanni Mannino and Rosa Ruggeri and Alessandra Alberti,Electrical Properties of Ultrathin SiO₂ Layer Deposited at 50℃ by Inductively Coupled Plasma-Enahnced Chemical Vapor Deposition,Applied physics express : APEX,18820778,Tokyo : Japan Society of Applied Physics,2012-02,5,2,,https://cir.nii.ac.jp/crid/1522262180675057152,