著者名,論文名,雑誌名,ISSN,出版者名,出版日付,巻,号,ページ,URL,URL(DOI)
Ryosuke Kometani and Kenji Ishikawa and Keigo Takeda,A High-Temperature Nitrogen Plasma Etching for Preserving Smooth and Stoichiometric GaN Surface,Applied physics express : APEX,18820778,Tokyo : Japan Society of Applied Physics,2013-05,6,5,056201,https://cir.nii.ac.jp/crid/1522262180733318144,https://doi.org/10.7567/apex.6.056201