著者名,論文名,雑誌名,ISSN,出版者名,出版日付,巻,号,ページ,URL,URL(DOI)
Sabina Spiga and Francesco Driussi and Alessio Lamperti,Effects of Thermal Treatments on the Trapping Properties of HfO₂ Films for Charge Trap Memories,Applied physics express : APEX,18820778,Tokyo : Japan Society of Applied Physics,2012-02,5,2,,https://cir.nii.ac.jp/crid/1522825130142674944,