Author,Title,Journal,ISSN,Publisher,Date,Volume,Number,Page,URL,URL(DOI)
白川 三千紘 and 井上 尚紀 and 古谷 創 and 山本 慶 and 後藤 研由 and 藤田 光宏,Advanced patterning approaches based on negative tone development (NTD) process for further extension of 193 nm immersion lithography,Fujifilm research & development = 富士フイルム研究報告,09151478,南足柄 : 富士フイルムR&D統括本部足柄図書室,2017,,62,143-151,https://cir.nii.ac.jp/crid/1523106606030052480,