著者名,論文名,雑誌名,ISSN,出版者名,出版日付,巻,号,ページ,URL,URL(DOI)
Jaewook Jeong and Gwang Jun Lee and Joonwoo Kim,Oxygen Dispersive Diffusion Induced Bias stress Instability in Thin Active Layer Amorphous ln-Ga-Zn-O Thin-Film Transistors,Applied physics express : APEX,18820778,Tokyo : Japan Society of Applied Physics,2013-03,6,3,,https://cir.nii.ac.jp/crid/1523388079999499648,