著者名,論文名,雑誌名,ISSN,出版者名,出版日付,巻,号,ページ,URL,URL(DOI)
"WATANABE,Hisashi and TODOKORO,Yoshihiro and INOUE,Morio",Thermodynamics of Development Process of Positive Resists in Binary Mixed Developer : Resist Material and Process :,JJAP series,,Japanese Journal of Applied Physics,1991-01-31,4,,143-146,https://cir.nii.ac.jp/crid/1543105995097969280,