著者名,論文名,雑誌名,ISSN,出版者名,出版日付,巻,号,ページ,URL,URL(DOI)
"FUYUKI,Takashi and SAITOH,Takashi and MATSUNAMI,Hiroyuki",Low-Temperature Deposition of Hydrogen-Free Silicon Oxynitride without Stress by the Remote Plasma Technique : Etching and Deposition Technology :,JJAP series,,Japanese Journal of Applied Physics,1991-01-31,4,,209-212,https://cir.nii.ac.jp/crid/1543668945051393280,