著者名,論文名,雑誌名,ISSN,出版者名,出版日付,巻,号,ページ,URL,URL(DOI)
室田 淳一,Relationship between Total Arsenic and Electrically Active Arsenic Concentrations in Silicon Produced by the Diffusion Process,Journal of Applied Physics,0021-8979,American Institute of Physics,1979,50,2,804-808,https://cir.nii.ac.jp/crid/1570009752704502016,