著者名,論文名,雑誌名,ISSN,出版者名,出版日付,巻,号,ページ,URL,URL(DOI)
HEN Hanwei,Electrochemical characteristic of chemical-mechanical polishing of copper with oxide passive film,Trans. Nonferrous M e. Soc. China,,,2003,,,,https://cir.nii.ac.jp/crid/1570572701788969472,