著者名,論文名,雑誌名,ISSN,出版者名,出版日付,巻,号,ページ,URL,URL(DOI)
Fan Jia-Fa and Sugioka Koji and Toyoda Koichi,Low-Temperature Growth of Thin Films of Al<SUB>2</SUB>O<SUB>3</SUB> by Sequential Surface Chemical Reaction of trimethylaluminum and H<SUB>2</SUB>O<SUB>2</SUB>,Japanese Journal of Applied Physics,0021-4922,公益社団法人 応用物理学会,1991,30,6,L1139-L1141,https://cir.nii.ac.jp/crid/1570572703213726848,