Author,Title,Journal,ISSN,Publisher,Date,Volume,Number,Page,URL,URL(DOI) Fan Jia-Fa and Sugioka Koji and Toyoda Koichi,Low-Temperature Growth of Thin Films of Al2O3 by Sequential Surface Chemical Reaction of trimethylaluminum and H2O2,Japanese Journal of Applied Physics,0021-4922,The Japan Society of Applied Physics,1991,30,6,L1139-L1141,https://cir.nii.ac.jp/crid/1570572703213726848,