著者名,論文名,雑誌名,ISSN,出版者名,出版日付,巻,号,ページ,URL,URL(DOI)
Ishihara Ryouichi and Kanoh Hiroshi and Sugiura Osamu and Matsumura Masakiyo,Low-Temperature Chemical Vapor Deposition of Silicon Nitride Using A New Source Gas (Hydrogen Azide),Japanese Journal of Applied Physics,0021-4922,公益社団法人 応用物理学会,1992,31,2,L74-L77,https://cir.nii.ac.jp/crid/1570572703213999616,