Author,Title,Journal,ISSN,Publisher,Date,Volume,Number,Page,URL,URL(DOI)
Ishihara Ryouichi and Kanoh Hiroshi and Sugiura Osamu and Matsumura Masakiyo,Low-Temperature Chemical Vapor Deposition of Silicon Nitride Using A New Source Gas (Hydrogen Azide),Japanese Journal of Applied Physics,0021-4922,The Japan Society of Applied Physics,1992,31,2,L74-L77,https://cir.nii.ac.jp/crid/1570572703213999616,