Author,Title,Journal,ISSN,Publisher,Date,Volume,Number,Page,URL,URL(DOI)
OGISHIMA Takuya and AOKI Toru and NAKANISHI Yoichiro and HATANAKA Yoshinori and WROBE A. M.,Preparation of SiN thin films by remote plasma CVD method using TDMAS,Technical report of IEICE. SDM,,"The Institute of Electronics, Information and Communication Engineers",1997-05-23,97,68,1-7,https://cir.nii.ac.jp/crid/1570854177466847232,