Author,Title,Journal,ISSN,Publisher,Date,Volume,Number,Page,URL,URL(DOI)
ABE Haruhiko and NISHIOKA Kyusaku and TAMURA Setsuko and NISHIMOTO Akira,Microfabrication of Anti-Reflective Chromium Mask by Gas Plasma : A-1: DEVICE TECHNOLOGY (I),Japanese journal of applied physics. Supplement,00214922,The Japan Society of Applied Physics,1976,15,1,25-31,https://cir.nii.ac.jp/crid/1571980077370669568,