著者名,論文名,雑誌名,ISSN,出版者名,出版日付,巻,号,ページ,URL,URL(DOI)
Hara Tohru and Enomoto Shuichi and Ohtsuka Noboru and Shima Shohei,Barrier Effects of Tungsten Infer-Layer for Aluminum Diffusion in Aluminum/Silicon Ohmic-Contact System,Japanese Journal of Applied Physics,0021-4922,公益社団法人 応用物理学会,1985,24,7,828-831,https://cir.nii.ac.jp/crid/1572543028034749440,