著者名,論文名,雑誌名,ISSN,出版者名,出版日付,巻,号,ページ,URL,URL(DOI)
WAGNER C.,EUV lithography at chipmakers has started : Performance validation of ASML's NXE:3100,Proc. SPIE,,,2011,7969,,79691F,https://cir.nii.ac.jp/crid/1572824500627546368,