著者名,論文名,雑誌名,ISSN,出版者名,出版日付,巻,号,ページ,URL,URL(DOI)
RHEE J. K.,Fabrication of wide-head T-gate 0.2μm gate length using E beam lithography for MIMIC applications,IEEK autumn conference 1999,,,1999,22,2,187-190,https://cir.nii.ac.jp/crid/1573105975474594816,