Laminated polarization splitters consist of poly-silicon and silica layers

MURO Kouichi, SHIRAISHI Kazuo, MATSUMURA Kazuhito

Bibliographic Information

Other Title

多結晶シリコンと石英との交互多層膜から成る積層形偏光分離素子

Description

We proposed a new laminated polarization splitters that consist of alternately laminated poly-Si and silica layers. Multilayers are deposited onto a silica substrate by use of the rf sputtering method, in which the substrate is heated up to a temperature or 800℃. Poly-Si and silica films are deposited by use of Ar and a mixture of Ar and oxigen sputtering gasses, respectively. The deposition can be done by only controlling oxigen inclusion into the sputtering gas. The fabrication method has features, such as simple, speedy, and needs no mechanical movement in the process chamber. The fabricated polarization splitter has a beam splitting angle as large as 21°at the wavelength 1.55 μm, which is roughly 4 times larger than that of rutile or calcite. The splitter would be applicable to the wavelength region 1.3 μm. It has also been found that a surface of a laminated films is smooth neverthless surfaces of poly-Si layers are relatively rough, which is due to migration effects of silica.

Journal

Technical report of IEICE. OCS

Technical report of IEICE. OCS 96 (334), 37-42, 1996-10-31

The Institute of Electronics, Information and Communication Engineers

Keywords

Details 詳細情報について

CRID: 1573105977245639552

NII Article ID: 110003285572

NII Book ID: AN10060797

Text Lang: ja

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