著者名,論文名,雑誌名,ISSN,出版者名,出版日付,巻,号,ページ,URL,URL(DOI)
TOMIE T.,Study of a cavity confined plasma as a debris-less and high conversion efficiency EUV source,"2nd Int. Workshop on EUV Lithography (San Francisco, October)",,,2000,,,,https://cir.nii.ac.jp/crid/1573387449951427072,