Author,Title,Journal,ISSN,Publisher,Date,Volume,Number,Page,URL,URL(DOI)
Sugiyama Yoshinobu and Nakamura Kiyoto and Sano Koji and Uekusa Shin-ichiro,Cleaning Process of Etch-Free InP Substrate and Molecular Beam Epitaxy of InGaAs System,IEICE technical report. Electron devices,,"The Institute of Electronics, Information and Communication Engineers",1993-05-20,93,45,31-36,https://cir.nii.ac.jp/crid/1573387452170327552,