Author,Title,Journal,ISSN,Publisher,Date,Volume,Number,Page,URL,URL(DOI)
KUDOH Tsugutomo and SUGAWARA Fumihiko and OHNUMA Koichi,Improvement of breakdown voltage for Self-biased Channel Diode by deep boron ion implantation,IEICE technical report. Electromagnetic compatibility,,"The Institute of Electronics, Information and Communication Engineers",2012-10-18,112,256,93-97,https://cir.nii.ac.jp/crid/1573668927652276480,