著者名,論文名,雑誌名,ISSN,出版者名,出版日付,巻,号,ページ,URL,URL(DOI)
KERN W.,Cleaning solutions based on hydrogen peroxide for use in silicon semiconductor technology,RCA Review,,,1970,31,,187-206,https://cir.nii.ac.jp/crid/1573950398886505472,