著者名,論文名,雑誌名,ISSN,出版者名,出版日付,巻,号,ページ,URL,URL(DOI)
YOSHIMI Makoto and TAKAHASHI Minoru and KAWABUCHI Katsuhiro and KATO Yoshihide and TAKIGAWA Tadahiro,High Voltage Electron Beam Writing for Submicron Design Rule VLSI Fabrications : A-5: PROCESS TECHNOLOGY,Japanese journal of applied physics. Supplement,00214922,社団法人応用物理学会,1983-02-28,22,1,179-182,https://cir.nii.ac.jp/crid/1574231877184190208,