著者名,論文名,雑誌名,ISSN,出版者名,出版日付,巻,号,ページ,URL,URL(DOI)
Tsukasa Abe and Hiroshi Mohri and Tadahiko Takigawa and Kawashima Satoshi and Ogase Taichi and Takeya Shimomura and Yuichi Inazuki and Naoya Hayashi,Investigation of the influence of resist patterning on absorber LWR for 22-nm-node EUV lithography,SPIE Proceedings,0277-786X,SPIE,2010-09-30,7823,,78231W,https://cir.nii.ac.jp/crid/1870020692734488064,https://doi.org/10.1117/12.869592