著者名,論文名,雑誌名,ISSN,出版者名,出版日付,巻,号,ページ,URL,URL(DOI) H. Morita and Masaharu Oshima and Hiroshi Kumigashira and H. Sugaya and Satoshi Toyoda,Determining factor of effective work function in metal/bi-layer high-k gate stack structure studied by photoemission spectroscopy,Applied Physics Letters,0003-6951,AIP Publishing,2012-03-12,100,,,https://cir.nii.ac.jp/crid/1870020693237780352,https://doi.org/10.1063/1.3695166