Author,Title,Journal,ISSN,Publisher,Date,Volume,Number,Page,URL,URL(DOI)
Iwao Nishiyama and Tsukasa Abe and Fumiaki Kumasaka and Yuusuke Tanaka and Naoya Hayashi and Hiroshi Mohri and Tsuyoshi Amano,Evaluation of defect repair of EUV mask absorber layer,SPIE Proceedings,0277-786X,SPIE,2005-06-28,5853,,866,https://cir.nii.ac.jp/crid/1870302167712304000,https://doi.org/10.1117/12.617273