Author,Title,Journal,ISSN,Publisher,Date,Volume,Number,Page,URL,URL(DOI)
Toshiaki Makabe and T. Yagisawa,Dependence of trench charging on the velocity distribution of ions incident on a SiO/sub 2/ wafer,"The 30th International Conference on Plasma Science, 2003. ICOPS 2003. IEEE Conference Record - Abstracts.",,IEEE,2003-12-22,,,128,https://cir.nii.ac.jp/crid/1870302167849606656,https://doi.org/10.1109/plasma.2003.1228545