Author,Title,Journal,ISSN,Publisher,Date,Volume,Number,Page,URL,URL(DOI)
Yushi Kato and M. Wakatsuchi and F. Tani and M. Sunagawa and Shigeyuki Ishii,Development of ECR sheet plasma source for ion-enhanced reactive sputter deposition,Proceedings of 11th International Conference on Ion Implantation Technology,,IEEE,2002-12-24,,,800-803,https://cir.nii.ac.jp/crid/1870302167982109312,https://doi.org/10.1109/iit.1996.586582