著者名,論文名,雑誌名,ISSN,出版者名,出版日付,巻,号,ページ,URL,URL(DOI)
H. Masumura and Yoh-Ichiro Ogita and M. Nakano,Noncontact Photoconductivity Amplitude Technique to Characterize Polishing- and Slicing-Induced Residual Damage in Si Wafers,MRS Proceedings,0272-9172,Springer Science and Business Media LLC,1995-01-01,378,,,https://cir.nii.ac.jp/crid/1870302168020068096,https://doi.org/10.1557/proc-378-591