Author,Title,Journal,ISSN,Publisher,Date,Volume,Number,Page,URL,URL(DOI)
Takeshi Katsuma and Ri-ichi Murakami and Md. Shamimur Rahman and Daisuke Yonekura,Effect of Bias Voltage on Fatigue Behavior of CrN Film Deposited on Ti-6Al-4V Alloy,"ASME 2008 International Manufacturing Science and Engineering Conference, Volume 1",,ASMEDC,2008-01-01,,,169-174,https://cir.nii.ac.jp/crid/1870302168075383552,https://doi.org/10.1115/msec_icmp2008-72441