著者名,論文名,雑誌名,ISSN,出版者名,出版日付,巻,号,ページ,URL,URL(DOI)
S. Sohara and Hideki Matsumura and Manabu Kudo and Akira Izumi,Low Temperature Formation of Ultra-Thin SiO<sub>2</sub> Layers Using Direct Oxidation Method in a Catalytic Chemical Vapor Deposition System,MRS Proceedings,0272-9172,Springer Science and Business Media LLC,1999-01-01,567,,,https://cir.nii.ac.jp/crid/1870583642695203072,https://doi.org/10.1557/proc-567-115