Author,Title,Journal,ISSN,Publisher,Date,Volume,Number,Page,URL,URL(DOI)
Noriyuki Kondou and Hirokimi Shirasaki and Kunio Ueta,Resist and silicon trench array line width measurement simulations for the next-generation semiconductor circuits by optical scattering properties using the FDTD method,SPIE Proceedings,0277-786X,SPIE,2003-05-27,5038,,748,https://cir.nii.ac.jp/crid/1870583642715666816,https://doi.org/10.1117/12.482643