著者名,論文名,雑誌名,ISSN,出版者名,出版日付,巻,号,ページ,URL,URL(DOI)
Takayuki Toshima and Yasunobu Oonishi and Naofumi Shibata and Daisuke Kawamura and Tomoyuki Takeishi and Tetsu Kawasaki and Kentarou Matsunaga and Satoru Shimura and Seiki Ishida and Shinichi Ito and Hideharu Kyoda and Koutarou Sho and Kaoru Ozawa,Influence of the watermark in immersion lithography process,SPIE Proceedings,0277-786X,SPIE,2005-05-04,5753,,818,https://cir.nii.ac.jp/crid/1870865118273824512,https://doi.org/10.1117/12.599314