Author,Title,Journal,ISSN,Publisher,Date,Volume,Number,Page,URL,URL(DOI)
Masahide Inuishi and Hiroshi Umeda and Akinobu Teramoto and Yukio Nishida and J. Tsuchimoto and H. Sayama and Yasuo Inoue and H. Oda and Katsumi Eikyu,80 nm CMOSFET technology using double offset-implanted source/drain extension and low temperature SiN process,International Electron Devices Meeting 2000. Technical Digest. IEDM (Cat. No.00CH37138),,IEEE,2002-11-11,,,239-242,https://cir.nii.ac.jp/crid/1871146593148866432,https://doi.org/10.1109/iedm.2000.904301