Author,Title,Journal,ISSN,Publisher,Date,Volume,Number,Page,URL,URL(DOI)
Akira Hokazono and Kazuya Ohuchi and Ichiro Mizushima and Kiyotaka Miyano and Y. Tsunashima,Low thermal budget elevated source/drain technology utilizing novel solid phase epitaxy and selective vapor phase etching,International Electron Devices Meeting 2000. Technical Digest. IEDM (Cat. No.00CH37138),,IEEE,2002-11-11,,,433-436,https://cir.nii.ac.jp/crid/1871709542482202368,https://doi.org/10.1109/iedm.2000.904349