著者名,論文名,雑誌名,ISSN,出版者名,出版日付,巻,号,ページ,URL,URL(DOI) Makoto Saito and H. Eto and K. Omiya,38.3: High Selectivity Photoresist Ashing by the Addition of NH3 to CF4/O2 or CHF3/O2,SID Symposium Digest of Technical Papers,0097-966X,Wiley,1999-05-01,30,,844-847,https://cir.nii.ac.jp/crid/1871709543196292736,https://doi.org/10.1889/1.1834156