著者名,論文名,雑誌名,ISSN,出版者名,出版日付,巻,号,ページ,URL,URL(DOI)
Sadayoshi Horii and Takashi Fuyuki and H. Nakamura and Tomoaki Hatayama and Hiroshi Yano and Yukiharu Uraoka and Prakaipetch Punchaipetch,Low temperature nitridation of PLCVD HfSixOy gate dielectrics using nitrogen radicals,"International Meeting for Future of Electron Devices, 2004.",,IEEE,2006-01-05,,,83-84,https://cir.nii.ac.jp/crid/1871991017500881664,https://doi.org/10.1109/imfedk.2004.1566419