著者名,論文名,雑誌名,ISSN,出版者名,出版日付,巻,号,ページ,URL,URL(DOI)
Takeshi Ohshima and Shin-ichiro Sato,Ion irradiation effects on electric properties of hydrogenated amorphous silicon thin films,SPIE Proceedings,0277-786X,SPIE,2013-05-29,8725,,87252C,https://cir.nii.ac.jp/crid/1871991017820130944,https://doi.org/10.1117/12.2015110