Author,Title,Journal,ISSN,Publisher,Date,Volume,Number,Page,URL,URL(DOI)
Shun Ichiro Tanaka,Measured Stress Concentration at a Notch Front in Si<sub>3</sub>N<sub>4</sub>,Materials Science Forum,1662-9752,"Trans Tech Publications, Ltd.",2000-05-21,347-349,,586-591,https://cir.nii.ac.jp/crid/1871991018050739072,https://doi.org/10.4028/www.scientific.net/msf.347-349.586