著者名,論文名,雑誌名,ISSN,出版者名,出版日付,巻,号,ページ,URL,URL(DOI)
Masaya Asano and S. Mitamura and H. Niwa and Naoya Hayashi and Daichi Okuno and Kazutaka Tamura and Masaaki Kurihara and Shigeyoshi Kanetsuki,Development of a high-performance e-beam resist suitable for advanced mask fabrication,SPIE Proceedings,0277-786X,SPIE,1998-09-01,3412,,237,https://cir.nii.ac.jp/crid/1872272492403990016,https://doi.org/10.1117/12.328813