Author,Title,Journal,ISSN,Publisher,Date,Volume,Number,Page,URL,URL(DOI)
Kouji Ishida and Nobuhito Toyama and Hiroyuki Miyashita,Improvement of OPC data processing for photomask fabrication,SPIE Proceedings,0277-786X,SPIE,1999-08-25,3748,,241,https://cir.nii.ac.jp/crid/1872272492548282496,https://doi.org/10.1117/12.360196