著者名,論文名,雑誌名,ISSN,出版者名,出版日付,巻,号,ページ,URL,URL(DOI)
Takuo Kanayama and Hiroshi Konno and Keiji Hayashi and Takashi Oseki,Spatial profile of neutral free radical beam produced by the method of phot-deionization of negative ion beams,Digest of Papers Microprocesses and Nanotechnology 2003. 2003 International Microprocesses and Nanotechnology Conference,,Japan Soc. of Appl. Phys,2004-05-13,,,272-273,https://cir.nii.ac.jp/crid/1872272492610403328,https://doi.org/10.1109/imnc.2003.1268751