著者名,論文名,雑誌名,ISSN,出版者名,出版日付,巻,号,ページ,URL,URL(DOI)
Hiroshi Watanabe and Tomoyuki Matsuyama and Eiji Tsujimoto and Shintaro Kudo and Kei Mesuda and Katsuya Hayano and Hideyoshi Takamizawa and Toshio Ohhashi and Naruo Sakasai,Mask blank material optimization impact on leading-edge ArF lithography,SPIE Proceedings,0277-786X,SPIE,2011-04-29,8081,,808102,https://cir.nii.ac.jp/crid/1872272492935734144,https://doi.org/10.1117/12.899909