Author,Title,Journal,ISSN,Publisher,Date,Volume,Number,Page,URL,URL(DOI)
Devendra Joshi and Artur Balasinski and Linard Karklin and Valery Axelrad and Walter Iandolo,Advanced procedure to evaluate process performance at very low k 1 based on device parameters linked to lithography and process data:II. Verification of cell layout based on integration of optical an,SPIE Proceedings,0277-786X,SPIE,2001-09-14,4346,,1514,https://cir.nii.ac.jp/crid/1872553967769334528,https://doi.org/10.1117/12.435693