著者名,論文名,雑誌名,ISSN,出版者名,出版日付,巻,号,ページ,URL,URL(DOI)
Yoshihiro Oda and Yoshihiro Todokoro,Enhanced lithography CoO model: considerations for advanced mask,SPIE Proceedings,0277-786X,SPIE,1998-09-01,3412,,174,https://cir.nii.ac.jp/crid/1872553967881250432,https://doi.org/10.1117/12.328798