Author,Title,Journal,ISSN,Publisher,Date,Volume,Number,Page,URL,URL(DOI)
S. Ojima and S. Yasui and N. Yonekawa and Tadahiro Ohmi,Carbon Contamination Free Wafer Cleaning,"International Symposium on Semiconductor Manufacturing, Extended Abstracts of ISSM",,IEEE,2005-08-24,,,219-220,https://cir.nii.ac.jp/crid/1872553968125112832,https://doi.org/10.1109/issm.1994.729462