著者名,論文名,雑誌名,ISSN,出版者名,出版日付,巻,号,ページ,URL,URL(DOI)
Minoru Noda and Toshiyuki Nakaiso and Masanori Okuyama and Kazushi Kodama and Hideki Sugiyama and Mitsue Takahashi,An analysis of effects of device structures on retention characteristics in MFIS structures,ISAF 2000. Proceedings of the 2000 12th IEEE International Symposium on Applications of Ferroelectrics (IEEE Cat. No.00CH37076),,IEEE,2002-11-11,1,,337-340,https://cir.nii.ac.jp/crid/1872835442677230208,https://doi.org/10.1109/isaf.2000.941567