著者名,論文名,雑誌名,ISSN,出版者名,出版日付,巻,号,ページ,URL,URL(DOI)
Tadahiro Ohmi and Takahisa Nitta and T. Takewaki,A novel self-aligned surface-silicide passivation technology for reliability enhancement in copper interconnects,1995 Symposium on VLSI Technology. Digest of Technical Papers,,Japan Soc. Appl. Phys,2002-11-19,,,31-32,https://cir.nii.ac.jp/crid/1872835442924285952,https://doi.org/10.1109/vlsit.1995.520845