Author,Title,Journal,ISSN,Publisher,Date,Volume,Number,Page,URL,URL(DOI)
K. Uehara and Suguru Kameda and S.-K. Kim and Y. Aota and Hiroyuki Nakase and Kazuo Tsubouchi and C.-M. Yang and Yoji Isota,Growth of AlN film on Mo/SiO/sub 2//Si [111] for 5GHz-band FBAR using MOCVD,"IEEE Ultrasonics Symposium, 2004",,IEEE,2005-04-19,1,,165-168,https://cir.nii.ac.jp/crid/1872835442979254016,https://doi.org/10.1109/ultsym.2004.1417694