Author,Title,Journal,ISSN,Publisher,Date,Volume,Number,Page,URL,URL(DOI)
Koutarou Sho and Kazunori Iida and Tsuyoshi Morisaki and Ken Furubayashi and Naoki Sato and Seiro Miyoshi and Hidefumi Mukai and Shinji Yamaguchi and Satoshi Usui,Mask defect printability in the Self-Aligned Quadruple Patterning (SAQP) process,SPIE Proceedings,0277-786X,SPIE,2016-03-15,9780,,97800O,https://cir.nii.ac.jp/crid/1873116917362856320,https://doi.org/10.1117/12.2218416