著者名,論文名,雑誌名,ISSN,出版者名,出版日付,巻,号,ページ,URL,URL(DOI)
Takahiro Kozawa and Masaki Mitsuyasu and Hiroki Yamamoto,Effects of low-molecular weight resist components on dissolution behavior of chemically amplified resists for extreme ultraviolet lithography studied by quartz crystal microbalance,SPIE Proceedings,0277-786X,SPIE,2015-03-19,9422,,94222D,https://cir.nii.ac.jp/crid/1873398392491110912,https://doi.org/10.1117/12.2085482